Reduction of nanoparticles in optical thin films through ion etching

verfasst von

Joshua McCauley, Marco Jupé, Jinlong Zhang, Andreas Wienke, Detlev Ristau

Abstract

Contaminating particles in optical thin films can lead to the formation of nodules and reduction of laser induced damage threshold (LIDT). This work investigates the suitability of ion etching of the substrates to reduce the impact of nanoparticles. Initial investigations suggest that ion etching can remove nanoparticles from the sample surface; however, doing so introduces texturing to the surface of the substrate. This texturing leads to an increase in optical scattering loss, though LIDT measurements show no significant reduction in the durability of the substrate.

Organisationseinheit(en)

PhoenixD: Simulation, Fabrikation und Anwendung optischer Systeme
Institut für Quantenoptik

Externe Organisation(en)

Laser Zentrum Hannover e.V. (LZH)
MOE Key Laboratory of Advanced Micro-Structured Materials
Tongji University

Typ

Artikel

Journal

Applied optics

Band

62

Seiten

B117-B125

ISSN

1559-128X

Publikationsdatum

17.01.2023

Publikationsstatus

Veröffentlicht

Peer-reviewed

Ja

ASJC Scopus Sachgebiete

Atom- und Molekularphysik sowie Optik, Ingenieurwesen (sonstige), Elektrotechnik und Elektronik

Elektronische Version(en)

https://doi.org/10.1364/AO.478263 (Zugang: Geschlossen)