Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production

verfasst von

Lei Zheng, Axel Günther, Reinhard Caspary, Wolfgang Kowalsky, Bernhard Roth

Abstract

In this work, we demonstrate a fabrication strategy for micro- and nanooptical structures by integrating UV-nanoimprint lithography (NIL) towards two-photon polymerization (2PP) for cost-effective scalable production. Herein, 2PP was first employed to create the structures. These were then used as master molds for the subsequent UV-NIL process for high-throughput replication. With this fabrication strategy, various structures with dimensions from sub-micrometer to centimeter scales were produced and replicated. High-quality UV imprinting of the 2PP-produced master sample can be realized. The demonstrated fabrication strategy exhibits great potential for applications in scalable production of optical and optoelectronic devices or systems.

Organisationseinheit(en)

PhoenixD: Simulation, Fabrikation und Anwendung optischer Systeme
Hannoversches Zentrum für Optische Technologien (HOT)

Externe Organisation(en)

Technische Universität Braunschweig

Typ

Aufsatz in Konferenzband

Publikationsdatum

15.03.2023

Publikationsstatus

Veröffentlicht

Peer-reviewed

Ja

ASJC Scopus Sachgebiete

Elektronische, optische und magnetische Materialien, Physik der kondensierten Materie, Angewandte Informatik, Angewandte Mathematik, Elektrotechnik und Elektronik

Elektronische Version(en)

https://doi.org/10.1117/12.2648030 (Zugang: Geschlossen)