Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production

authored by

Lei Zheng, Axel Günther, Reinhard Caspary, Wolfgang Kowalsky, Bernhard Roth

Abstract

In this work, we demonstrate a fabrication strategy for micro- and nanooptical structures by integrating UV-nanoimprint lithography (NIL) towards two-photon polymerization (2PP) for cost-effective scalable production. Herein, 2PP was first employed to create the structures. These were then used as master molds for the subsequent UV-NIL process for high-throughput replication. With this fabrication strategy, various structures with dimensions from sub-micrometer to centimeter scales were produced and replicated. High-quality UV imprinting of the 2PP-produced master sample can be realized. The demonstrated fabrication strategy exhibits great potential for applications in scalable production of optical and optoelectronic devices or systems.

Organisation(s)

PhoenixD: Photonics, Optics, and Engineering - Innovation Across Disciplines
Hannover Centre for Optical Technologies (HOT)

External Organisation(s)

Technische Universität Braunschweig

Type

Conference contribution

Publication date

15.03.2023

Publication status

Published

Peer reviewed

Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials, Condensed Matter Physics, Computer Science Applications, Applied Mathematics, Electrical and Electronic Engineering

Electronic version(s)

https://doi.org/10.1117/12.2648030 (Access: Closed)